A days shoot in a laboratory using specialist macro lenses and careful lighting to show some extremely small processes in the testing of Hall Effect Sensors.
Paragraf is a spin-out from a specialist group in the Department of Materials Science at Cambridge University, under Professor Sir Colin Humphreys. The company was founded in 2019 and has perfected and patented a process of depositing single-atom thick, two-dimensional materials, including graphene, directly onto silicon and other semiconductor compatible substrates.
Paragraf’s new and unique scalable technology has enabled a contamination-free process for large-area graphene deposition, compatible with established semiconductor manufacturing processes. The production technique enables graphene formation directly onto semiconductor material surfaces and crystalline substrates. This makes graphene commercially viable and eliminates several processing requirements: increasing productivity and reduce costs.
The Paragraf Hall Effect Sensor (HES) is the first commercial application of graphene in an electronic device. This magnetic field sensing application delivers outstanding field resolution without signal conditioning. Other benefits include negligible planar Hall effect, and all-round robustness.
The GHS Series of analogue sensors is designed to provide very high-performance measurement, sensing and control for scientific research, healthcare, aerospace, industrial and automotive applications. This includes for example:
- Precision magnetic field measurement
- Accurate field gradient mapping and alignment
- High sensitivity current and power measurement
- High precision position, rotation and speed sensing
- Low power continuous monitoring
Type: Industrial Photography
Client: Paragraf
Product: Hall Effect Sensors
